Investigation of the effect of short-term exposure of oxygen and hydrogen plasma on the composition and structure of thin tin dioxide films

Modern technologies cannot do without the production of thin films tin dioxide, which are most widely used mainly in three areas: as transparent electrodes, catalysts, and solid-state sensors various gases. Their use electrodes is associated with a high transmittance dioxide layers optical range, well their low electrical resistivity. The effect short-term exposure to plasma on composition structure obtained from solution pentahydrate tetrachloride 97% ethanol different concentrations ions considered. A linear character dependence thickness SnO 2 concentration number deposited revealed. decrease resistance an increase initial was found. It shown that treatment hydrogen makes it possible reduce decreasing transparency. Treatment oxygen reduces transparency films, increases duration such treatment.